Advanced Micro-Fabrication Equipment Inc. China engages in the research and development, manufacture, and sale of high-end semiconductor equipment and pan-semiconductor equipment in China. It offers capacitive plasma etching equipment that is used in the etching of dielectric materials such as silicon oxide and nitride; inductive plasma etching equipment and deep silicon etching equipment, which is used in the single crystal silicon and polycrystalline silicon materials; and inductive plasma etching and deep silicon etching equipment for single crystal silicon and polycrystalline silicon. The company also provides MOCVD equipment; LPCVD equipment NAND contact holes and metal tungsten wires; and VOC equipment. Advanced Micro-Fabrication Equipment Inc. China was founded in 2004 and is headquartered in Shanghai, the People's Republic of China.